Registration on the website
June 01, 2026

Abstract Submission
June 28, 2026

Payment deadline
September 08, 2026

Dear Colleagues!

     We are pleased to announce the V International Conference “Atomic Layer Deposition: Russia-2026” (ALD-Russia-2026), which will be held in Novosibirsk (Akademgorodok) from September 8 to 11, 2026.

   We invite all the researchers interested in current atomic layer technologies, ranging from physicochemical principles to the production of new materials and the application of these processes to developing objects.

    The following sections are planned:

1. Atomic Layer Deposition (ALD) Processes
2. Atomic Layer Etching (ALE) Processes
3. Modeling of ALD/ALE Processes
4. Volatile Precursors for ALD/ALE Processes
5. Applications of ALD/ALE Processes: Equipment, Examples, and Prospects

Venue

Nikolaev Institute of Inorganic Chemistry, Siberian Branch of the Russian Academy of Sciences (NIIC SB RAS): 3 Acad. Lavrentiev Ave., Novosibirsk, 630090, Russia

Contact Information

Organizing Committee of the V International Conference "Atomic Layer Deposition: Russia-2026“ Адрес электронной почты защищен от спам-ботов. Для просмотра адреса в вашем браузере должен быть включен Javascript.